Improving monocrystalline silicon surface quality with chemical mechanical polishing using the slurry with the additive of isopropanol
Release time:2024-10-17
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Journal:Colloids and Surfaces A: Physicochemical and Engineering Aspects
Key Words:Monocrystalline silicon;Chemical mechanical polish; chemical mechanical polishing; material removal rate; monocrystalline silicon
Indexed by:Article
Correspondence Author:Jingjing Xia
Translation or Not:no
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