[极紫外光源用大口径 Mo/Si 多层膜厚度控制与热稳定性研究]
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Impact Factor:1.8
Affiliation of Author(s):物理科学与工程学院
Journal:Zhongguo Jiguang/Chinese Journal of Lasers
Place of Publication:PO BOX 800-211, SHANGHAI, 201800, PEOPLES R CHINA
Indexed by:Periodical papers
Correspondence Author:ZheZhang
Volume:51
Issue:7
ISSN No.:0258-7025
Translation or Not:no
Date of Publication:2024-01-01
Included Journals:SCOPUS、WOS、CNKI、CQVIP、CSCD、EI、WANFANG