Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique
DOI number:10.1364/OL.519527
Affiliation of Author(s):物理科学与工程学院
Journal:Optics Letters
Indexed by:Periodical papers
Discipline:Science
Document Type:J
Volume:49
Issue:9
Page Number:2237-2240
Translation or Not:no
Date of Publication:2024-04-16
Included Journals:SCI(E)