
Jingjing Xia
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- Alma Mater: 同济大学 More>
- Extraction of isotropic and anisotropic components for optical surface micro-metrology based on the two-dimensional power spectral density analysis
- Improving monocrystalline silicon surface quality with chemical mechanical polishing using the slurry with the additive of isopropanol
- Investigating the partial plastic formation mechanism of typical scratches on silicon wafers induced by rogue particles during chemical mechanical polishing
- Surface Morphology Evolution during Chemical Mechanical Polishing Based on Microscale Material Removal Modeling for Monocrystalline Silicon
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